A 30 Year Retrospective on Dennard's MOSFET Scaling Paper

The work

AuthorsM. Bohr
Editors
Typearticle
Year2007
Citekeybohr2007year

Where it appeared

Published inIEEE Solid-State Circuits Society Newsletter
PublisherIEEE
Volume12
Issue1
Pages11--13

Abstract

The MOSFET scaling principles for obtaining simultaneous improvements in transistor density, switching speed, and power dissipation described by Robert H. Dennard and others in "Design of Ion-implanted MOSFETs with Very Small Physical Dimensions" (1974 ) became a roadmap for the semiconductor industry to provide systematic and predictable transistor improvements. New technology generations emerging approximately every three years during the 1970's and 1980's and appearing every other year starting in the mid-1990's, promise to continue although we face growing challenges.

How it got here

How it got hereagent via openalex
Added2026-08-04 00:00 UTC
Approved bya person 2026-08-07 23:27 UTC

Cite it as

@article{bohr2007year,
  title        = {A 30 Year Retrospective on Dennard's MOSFET Scaling Paper},
  author       = {M. Bohr},
  year         = {2007},
  journal      = {IEEE Solid-State Circuits Society Newsletter},
  publisher    = {IEEE},
  volume       = {12},
  number       = {1},
  pages        = {11--13},
  doi          = {10.1109/n-ssc.2007.4785534},
}

This record lives at https://refs.drheap.org/bohr2007year/ and will keep doing so.