Stabilization of Silicon Surfaces by Thermally Grown Oxides

The work

AuthorsMena Atalla; Eileen Tannenbaum; E. J. Scheibner
Editors
Typearticle
Year1959
Citekeyatalla1959stabilization

Where it appeared

Published inBell System Technical Journal
PublisherInstitute of Electrical and Electronics Engineers
Volume38
Issue3
Pages749--783

Related

Distinct fromkahng1963electric The oxide and the device built on it. Atalla, Tannenbaum and Scheibner establish in 1959 that a thermally grown silicon-silicon dioxide interface gives a stable silicon surface; Kahng's 1963 patent is the field-effect device that stands on exactly that system. The MOSFET's full name in the 1960 conference title request 98 asks for -- 'silicon-silicon dioxide field induced surface devices' -- names this result in its first four words.

Abstract

A study has been carried out of the stability of silicon surfaces when they are provided with a chemically bound solid-solid interface. Stable surfaces have been obtained with the system silicon-silicon dioxide when the oxide is thermally grown. This latter system has been studied in some detail. In this paper the following phases of our investigation are presented: (i) some aspects of the thermal oxidation process and properties of the oxide; (ii) the electronic properties of the resulting silicon-silicon dioxide interface; (iii) the application of the process to devices and resulting device characteristics.

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Cite it as

@article{atalla1959stabilization,
  title        = {Stabilization of Silicon Surfaces by Thermally Grown Oxides},
  author       = {Mena Atalla and Eileen Tannenbaum and E. J. Scheibner},
  year         = {1959},
  journal      = {Bell System Technical Journal},
  publisher    = {Institute of Electrical and Electronics Engineers},
  volume       = {38},
  number       = {3},
  pages        = {749--783},
  doi          = {10.1002/j.1538-7305.1959.tb03907.x},
}

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