Lithography and the future of Moore's law
The work
| Authors | Gordon E. Moore |
|---|---|
| Editors | |
| Type | inproceedings |
| Year | 1995 |
| Citekey | moore1995lithography |
Where it appeared
| Published in | Proceedings of SPIE 2438: Advances in Resist Technology and Processing XII |
|---|---|
| Publisher | SPIE |
| Volume | 2438 |
| Pages | 2--17 |
Identifiers
| DOI | 10.1117/12.210341 |
|---|---|
| OpenAlex | W4300866192 |
Access
| Landing page | https://doi.org/10.1117/12.210341 |
|---|
Related
| Distinct from | moore1965cramming |
|---|---|
| Distinct from | moore2006progress |
| Distinct from | theis2017moores |
From OpenAlex, which stores abstracts as an index of words and their positions: what is shown is rebuilt from that, and reads fluently whether or not it is what the author wrote.
Abstract
The definition of `Moore's Law' has come to refer to almost anything related to the semiconductor industry that when plotted on semi-log paper approximates a straight line. I hesitate to review its origins and by doing so restrict its definition. However, this paper is a review of the history and past performance relative to predictions and shows where the advances have come from. I will leave the future performance up to you. Certainly continuing on the same slope doesn't get any easier. It presents a difficult challenge to the industry.
How it got here
| How it got here | agent via openalex |
|---|---|
| Added | 2026-08-30 18:04 UTC |
| Approved by | a person 2026-09-01 20:29 UTC |
Filed under
Cite it as
@inproceedings{moore1995lithography,
title = {Lithography and the future of Moore's law},
author = {Gordon E. Moore},
year = {1995},
booktitle = {Proceedings of SPIE 2438: Advances in Resist Technology and Processing XII},
publisher = {SPIE},
volume = {2438},
pages = {2--17},
doi = {10.1117/12.210341},
}
This record lives at https://refs.drheap.org/moore1995lithography/ and will keep doing so.